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Electron-molecule collision processes lead to both chemical and
physical changes of matter in environments associated with radiation
chemistry, stability of waste repositories, plasma-enhanced chemical
vapour deposition (CVD), the lighting industry and plasma processing of
materials for microelectronics.
In industry, CO2 lasers require electron impact excitation
of vibrational and rotational states of the CO2and N2
to lase (Demaria 1979; hence an accurate knowledge of the relevant
cross-sections is necessary for modelling and optimisation of the laser
system.
In material science, electron scattering is used to probe the structure
of materials such as molecular crystals (Dorset 1996).
The molecules used to etch semiconductor materials do not react with
silicon surfaces unless they are subjected to electronic collisions to
produce highly reactive radicals and ions in the low-temperature
plasmas used in plasma etching and in plasma-enhanced chemical vapour
deposition.
Electrons in radioactive and chemical waste are responsible for much
of the chemistry that determines how these chemicals age and change.
Electron collisions create the reactive molecular fragments in the
plasma devices which are used to destroy undesirable compounds or
remediate NOx in combustion exhaust.

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